diener electronic  |  Plasma-Surface-Technology Plasma Plasma systems Surface-Technology
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 Etching of glass 
Chemical etching of glass is feasible using hydrofluoric acid, which ishighly toxic and may cause momentous burns. Alternatively, a controlledetching of glass is also possible in a plasma employingfluorine-containing process gases. In this method, there is no directcontact between the etching fluorine compounds and the environment.

   
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