diener electronic : Tetrafluoromethane


	Tetrafluoromethane Often employed as process gas in plasma processes, in particular inetching processes. Tetrafluormethane (CF4, also designated Freon 14) istotally inert under usual conditions, but generates free fluorine atomsand CF2- and CF3-radicals when employed as plasma process gas. Theseradicals exert a very strong etching effect, e. g. on silicon dioxide.Mixtures from CF4 and oxygen etch five times as fast as pure oxygen.

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